MicroLine 300关键尺寸的自动化光学测量系统

MicroLineTM 300是一款高性能测量晶圆、光罩、MEMS和其他微加工设备等关键尺寸的自动化测量系统。该系统配备了高质量光学显微镜和精密移动平台，可对200mm的晶圆上0.5μm到400μm的特征尺寸进行全自动的精密视场测量。

•  200 x 200mm精密X-Y平台

•  基于视觉的自动聚焦获得*佳影像质量

•  自动照明可编程光强

•  用于测量透明层、不规则边缘的线、厚膜等的强劲性能

•  完全可编程的序列，包括自动聚焦和关键尺寸测量

•  电动的6目物镜转换器，软件控制

•  可选的透射照明

技术规格：
- 测量行程: 200 x 200 x 25mm (XYZ)
- 平台运行: 交叉滚轴手动同轴定位和快速释放
- 视场内的测量精度: 0.010μm (用100x物镜)
- 特征尺寸: 视场内0.5μm - 400μm
- FOV测量重复性:<0.010μm on wafers (用100x物镜)
<0.005μm on photomasks (用100x物镜)
- 照明: 石英卤素灯, 反射光
自动照明
- 低噪音CCD VGA格式摄像头
- 图像处理60帧每秒
MicroLine 300的典型应用包括：

•  晶圆

•  光罩

•  MEMS

•  微型组件

测量类型:

•  关键尺寸:

           线宽 Linewidth
           节距 Pitch
           间隙 Spacing

•  Overlay

           Multi-layer registration
           Box in box
           Circle
           Edge roughness
           Butting error

美国进口 VIEW MicroLine 300 桌上型半自动CD测量系统 

美国进口 VIEW MicroLine 300 桌上型半自动CD测量系统 

MicroLine 300
Automated Optical Critical Dimension Metrology System

The MicroLineTM 300 is a high-performance Critical Dimension Measurement System for wafers, masks, MEMS, and other micro-fabricated devices. This capable instrument provides precise automated field-of-view measurement of features ranging in size from 0.5μm to 400μm on wafers up to 200mm.

•  200 x 200mm Precision X-Y stage

•  Vision-based autofocus for Optimum image quality

•  Autoillumination Programmable light intensity

•  Robust capacities for measuring transparent Layers, lines with irregular edges, thick films and more

•  Fully Programmable Sequences including autofocus and Critical Dimension Measurement

•  Motorized 6-Objective nosepiece with software control

•  Optional transmitted illumination 

Technical Specification
- Stage Travel: 200 x 200 x 25mm (XYZ)
- Stage Type: crossed-roller with manual co-axial positioning and quick release
- Measurement Accuracy in the field of view: 0.010μm (with 100x objective lens)
- Feature size: 0.5μm - 400μm within the field of view
- FOV Measurement repeatability:<0.010μm on wafers (with 100x objective lens)
<0.005μm on photomasks (with 100x objective lens)
- Illumination: Quartz-halogen, reflected light
Autoillumination
- Low-noise CCD VGA format camera
- Image processing at 60 frames per second
Typical Applications for MicroLine 300 include:

•  Wafers

•  Photomasks 

•  MEMS

•  Micro-scale components

Measurement Types:

•  Critical Dimensions:

               Linewidth
               Pitch
               Spacing

•  Overlay

             Multi-layer registration
             Box in box
             Circle
             Edge roughness
             Butting error